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HighP–TNano-Mechanics of Polycrystalline Nickel

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  • Additional Information
    • Publication Information:
      SpringerOpen, 2007.
    • Publication Date:
      2007
    • Collection:
      LCC:Materials of engineering and construction. Mechanics of materials
    • Abstract:
      AbstractWe have conducted highP–Tsynchrotron X-ray and time-of-flight neutron diffraction experiments as well as indentation measurements to study equation of state, constitutive properties, and hardness of nanocrystalline and bulk nickel. Our lattice volume–pressure data present a clear evidence of elastic softening in nanocrystalline Ni as compared with the bulk nickel. We show that the enhanced overall compressibility of nanocrystalline Ni is a consequence of the higher compressibility of the surface shell of Ni nanocrystals, which supports the results of molecular dynamics simulation and a generalized model of a nanocrystal with expanded surface layer. The analytical methods we developed based on the peak-profile of diffraction data allow us to identify “micro/local” yield due to high stress concentration at the grain-to-grain contacts and “macro/bulk” yield due to deviatoric stress over the entire sample. The graphic approach of our strain/stress analyses can also reveal the corresponding yield strength, grain crushing/growth, work hardening/softening, and thermal relaxation under highP–Tconditions, as well as the intrinsic residual/surface strains in the polycrystalline bulks. From micro-indentation measurements, we found that a low-temperature annealing (T < 0.4 Tm) hardens nanocrystalline Ni, leading to an inverse Hall–Petch relationship. We explain this abnormal Hall–Petch effect in terms of impurity segregation to the grain boundaries of the nanocrystalline Ni.
    • File Description:
      electronic resource
    • ISSN:
      1931-7573
      1556-276X
    • Relation:
      https://doaj.org/toc/1931-7573; https://doaj.org/toc/1556-276X
    • Accession Number:
      10.1007/s11671-007-9095-z
    • Accession Number:
      edsdoj.729029127a154a5cb2d581d1edd913ec