Low temperature p-i-n hybrid mesoporous optoelectronic device

11205,735

15/972204

May 06, 2018

Optoelectronic devices having an improved architecture are disclosed, such as p-i-n hybrid solar cells. These solar cells are characterized by including an insulating mesoporous scaffold in between the hole transportation layer and the photoactive layer, in such a way that the photoactive layer infiltrates the insulating mesoporous scaffold and contacts the hole transportation layer. The infiltration of the photoactive layer in the mesoporous scaffold improves the performance of the hole transportation layer and increases the photovoltaic performance of the solar cell. Solar cells, according to the present invention are manufactured in their entirety below 150° C. and present advantages in terms of cost and ease of manufacture, performance, and energy efficiency, stability over time and reproducibility.

Universidad de Antioquia (Medellin, CO); Anhidridos y Derivados de Colombia S.A.—Andercol (Medellin, CO); SUMINISTROS DE COLOMBIA S.A.S., SUMICOL (Sabaneta, CO); Empresas Públicas de Medellín E.S.P. (Medellin, CO)

Universidad de Antioquia (Medellin, CO), Anhidridos y Derivados de Colombia S.A.—Andercol (Medellin, CO), Suministros de Colombia S.A.S., SUMICOL (Sabaneta, CO), Empresas Publicas de Medellin (Medellin, CO)

1. A p-i-n optoelectronic device comprising: a transparent first electrode working as cathode, which allows light transmission into the device; a hole transport layer arranged on the transparent first electrode; an insulating mesoporous scaffold deposited on the hole transport layer; a photoactive capping layer with perovskite structure deposited on the insulating mesoporous scaffold, the photoactive capping layer capping the insulating mesoporous scaffold; an electron transport layer deposited on the photoactive capping layer; a second electrode working as anode, arranged on the electron transport layer; wherein: the insulating mesoporous scaffold acts as interface between the hole transport layer and the photoactive capping layer, and the photoactive capping layer contacts the hole transport layer through the insulating mesoporous scaffold.

2. The optoelectronic device according to claim 1 , wherein the device is manufactured in its entirety below 150° C.

3. The optoelectronic device according to claim 1 , wherein the insulating mesoporous scaffold comprises metal oxides or metal carbonates.

4. The optoelectronic device according to claim 3 , wherein the insulating mesoporous scaffold comprises any of ZrO 2 , Al 2 O 3 , CaCO 3 or combinations thereof.

5. The optoelectronic device according to claim 1 , wherein the hole transport layer is a transition metal oxide.

6. The optoelectronic device according to claim 5 , wherein the hole transport layer is doped with a metal comprising any of copper, lithium, or silver.

7. The optoelectronic device according to claim 1 , wherein the hole transport layer is NiO x , or NiO x doped with copper, lithium, or silver.

8. The optoelectronic device according to claim 1 , wherein the hole transport layer is an organic polymer.

9. The optoelectronic device according to claim 8 , wherein the hole transport layer is selected from poly(3,4-ethylenedioxythiophene):polystyrene sulfonate (PEDOT:PSS) and Spiro-OMeTAD.

10. The optoelectronic device according to claim 1 , wherein the electron transport layer comprises any of PC 60 BM, PC 70 BM, TiO 2 , SnO 2 or ZnO.

11. The optoelectronic device according to claim 1 , wherein the photoactive layer has an AMX 3 structure, wherein: A=cations of alkylamine C 1 -C 8 or alkali metals; M=a metal; and X=a halogen.

12. The optoelectronic device according to claim 11 , wherein A=CH 3 NH 3 , CH(NH 2) 2 , Cs; M=Pb, Sn, Ni, Co; and X=Cl, Br, I.

13. The optoelectronic device according to claim 1 , wherein the photoactive layer is A 2 B 2 M 3 X 10 , wherein: A=cations of alkylamine C 1 -C 8 or alkali metals; B=an amine iodide; M=a metal; and X=a halogen.

14. The optoelectronic device according to claim 13 , wherein the photoactive layer is A 2 B 2 M 3 X 10 , wherein: A=CH 3 NH 3 , CH(NH 2) 2 , Cs; B=C 3 H 10 IN, C 4 H 12 IN, C 7 H 10 IN; M=Pb, Sn, Ni, Co; and X=Cl, Br, I.

15. The optoelectronic device according to claim 1 , wherein the photoactive layer is an inorganic perovskite.

16. The optoelectronic device according to claim 15 , wherein the photoactive layer is selected from the group comprising Cs 2 SnI 6 , Cs 2 PbBr 6 , Rb 2 AgInBr 6 , Cs 2 BiAgBr 6 , Cs 2 BiAgC 16 and derivatives thereof.

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