- Patent Number:
11908,658
- Appl. No:
17/645859
- Application Filed:
December 23, 2021
- Abstract:
A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece. The deflection mechanism further comprises a third deflector located between the second deflector and the objective lens assembly and disposed in an opening delimited and circumscribed by the pole piece, and each of the first deflector, the second deflector and the third deflector is an electrostatic deflector.
- Inventors:
Zhongke Jingyuan Electron Limited, Beijing (CN) (Beijing, CN)
- Assignees:
Zhongke Jingyuan Electron Limited (Beijing, CN)
- Claim:
1. A scanning electron microscope device for a sample to be detected, which is configured to project an electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, comprising: an electron beam source configured to emit along an optical axis thereof the electron beam; a deflection mechanism, comprising: a first deflector located downstream of the electron beam source; and a second deflector located downstream of the first deflector; and an objective lens assembly, comprising: an excitation coil which is energized to create a magnetic field; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample, and comprises: a hollow body defining an internal chamber where the excitation coil is accommodated; and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece, wherein the deflection mechanism further comprises a third deflector located between the second deflector and the objective lens assembly and disposed in an opening delimited and circumscribed by the pole piece, and each of the first deflector, the second deflector and the third deflector is an electrostatic deflector, and wherein each of the first deflector, the second deflector and the third deflector is in the form of 8-pole or 12-pole electrostatic deflector, and is applied with respective electric excitation which is adjustable so as to adjust both direction and angle of the electron beam passing through the scanning electron microscope device.
- Claim:
2. The scanning electron microscope device according to claim 1 , wherein the pole piece is an end of the inclined portion of the magnetic yoke substantially disposed parallel to the optical axis, and a length of each electrode of the third deflector is of the same order of magnitude as a thickness of the pole piece but is not smaller than the thickness of the pole piece.
- Claim:
3. The scanning electron microscope device according to claim 2 , wherein the length of each electrode of the third deflector is equal to the thickness of the pole piece.
- Claim:
4. The scanning electron microscope device according to claim 1 , wherein the first deflector, the second deflector and the third deflector are arranged coaxially with each other or one another along the optical axis.
- Claim:
5. The scanning electron microscope device according to claim 1 , wherein electrodes of the third deflector are arranged at a predetermined angle relative to electrodes of the first deflector, and the predetermined angle is set such that an off-axis aberration of the electron beam which is subject to deflection applied by the third deflector is minimized.
- Claim:
6. The scanning electron microscope device according to claim 1 , wherein the third deflector is formed by a non-magnetizer material which is electrically conductive.
- Claim:
7. The scanning electron microscope device according to claim 1 , wherein the inclined portion of the objective lens assembly defines an electron beam channel shrinking towards the sample, with a portion of the electron beam channel at the third deflector being a gap defined between the electrodes of the third deflector in a diameter direction thereof.
- Claim:
8. The scanning electron microscope device according to claim 1 , further comprising a shielding plate provided below the third deflector, with an orthographic projection of the third deflector on a plane perpendicular to the optical axis completely falling in an orthographic projection of the shielding plate on the plane perpendicular to the optical axis.
- Claim:
9. The scanning electron microscope device according to claim 8 , wherein the shielding plate is made by metallic material, with an adjustable voltage applied thereon.
- Claim:
10. An electron beam inspection apparatus, comprising: the scanning electron microscope device according to claim 1 ; a first detector located downstream of the sample and configured to detect backscattered electrons generated by the electron beam incident on the surface of the sample; and a second detector located downstream of the sample and configured to detect secondary electrons generated by the electron beam incident on the surface of the sample.
- Claim:
11. A scanning electron microscope device for a sample to be detected, which is configured to project an electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, comprising: an electron beam source configured to emit along an optical axis thereof the electron beam; a deflection mechanism, comprising: a first deflector located downstream of the electron beam source; and a second deflector located downstream of the first deflector; and an objective lens assembly, comprising: an excitation coil which is energized to create a magnetic field; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample, and comprises: a hollow body defining an internal chamber where the excitation coil is accommodated; and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece, wherein the deflection mechanism further comprises a third deflector located between the second deflector and the objective lens assembly and disposed in an opening delimited and circumscribed by the pole piece, and each of the first deflector, the second deflector and the third deflector is an electrostatic deflector, and wherein the scanning electron microscope device further comprises a shielding plate provided below the third deflector, with an orthographic projection of the third deflector on a plane perpendicular to the optical axis completely falling in an orthographic projection of the shielding plate on the plane perpendicular to the optical axis.
- Claim:
12. The scanning electron microscope device according to claim 11 , wherein the shielding plate is made by metallic material, with an adjustable voltage applied thereon.
- Claim:
13. The scanning electron microscope device according to claim 11 , wherein each of the first deflector, the second deflector and the third deflector comprises a pair of electrodes provided opposite to each other and symmetrically relative to the optical axis, and is applied with respective electric excitation which is adjustable so as to adjust both direction and angle of the electron beam passing through the scanning electron microscope device.
- Claim:
14. The scanning electron microscope device according to claim 11 , wherein the first deflector, the second deflector and the third deflector are arranged coaxially with each other or one another along the optical axis.
- Claim:
15. The scanning electron microscope device according to claim 11 , wherein the third deflector is formed by a non-magnetizer material which is electrically conductive.
- Claim:
16. The scanning electron microscope device according to claim 11 , wherein the inclined portion of the objective lens assembly defines an electron beam channel shrinking towards the sample, with a portion of the electron beam channel at the third deflector being a gap defined between the electrodes of the third deflector in a diameter direction thereof.
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- Primary Examiner:
Vanore, David A
- Attorney, Agent or Firm:
Benesch, Friedlander, Coplan & Aronoff, LLP
- Accession Number:
edspgr.11908658
Processing Request
No Comments.