Method and system for registering circuit design layout and scanning electron microscope image, circuit design layout and imaging error calculation method thereof, and electronic device

12062,196

17/389394

July 30, 2021

The present invention provides a method for registering a circuit design layout and a scanning electron microscope image. The method comprises: step S1, providing a circuit design layout and a scanning electron microscope image; step S2: processing the circuit design layout to acquire a binary design layout image, and processing the scanning electron microscope image to acquire a binary scanning electron microscope image; step S3: performing Gaussian filtering on the binary design layout image and the binary scanning electron microscope image to maximize a gray value at a central axis of regions corresponding to a design pattern and a scanned pattern; and Step S4: performing registration according to the central axis of the design pattern and the scanned pattern. The present invention also provides a system for registering a circuit design layout and a scanning electron microscope image, a circuit design layout and an imaging error calculation method thereof, and an electronic device. The method and system for registering a circuit design layout and a scanning electron microscope image, the circuit design layout and the imaging error calculation method thereof, and the electronic device feature accurate registration and accurate error calculation.

SHENZHEN JINGYUAN INFORMATION TECHNOLOGY CO., LTD (Shenzhen, CN)

SHENZHEN JINGYUAN INFORMATION TECHNOLOGY CO., LTD (Shenzhen, CN)

1. A method for registering a circuit design layout and a scanning electron microscope image, comprising: Step S 1 : providing a circuit design layout to be registered and a scanning electron microscope image to be registered, wherein the circuit design layout to be registered comprises at least one design pattern, and the scanning electron microscope image to be registered comprises at least one scanning pattern corresponding to the at least one design pattern, the at least one design pattern covers the at least one scanning pattern; Step S 2 : binarizing the circuit design layout to be registered to obtain a binary image of the circuit design layout and binarizing the scanning electron microscope image to be registered to obtain a binary image of the scanning electron microscope image, wherein in the binary image of the circuit design layout, a gray value of the design pattern is 1, and a gray value outside the design pattern is 0; in the binary image of the scanning electron microscope image, a gray value of the scanning pattern is 1, and a gray value outside the scanning pattern is 0; Step S 3 : Gaussian filtering the binary image of the circuit design layout and the binary image of the scanning electron microscope image to make the gray value to be the largest at central axes of areas where the design pattern and the scanning pattern are located; and Step S 4 : registering the circuit design layout and the scanning electron microscope image according to the central axes by an image template matching method.

2. The method according to claim 1 , wherein Step S 1 comprises: Step S 11 : obtaining coordinates of the scanning pattern in the scanning electron microscope image; Step S 12 : determining an area in the circuit design layout corresponding to the design pattern according to the coordinates; and Step S 13 : expanding a distance D to the area to obtain an area where the design pattern corresponding to the scanning pattern is located, wherein D is not greater than 50 nm.

3. The method according to claim 1 , before Step S 2 or in Step S 2 comprising Step Sa 0 : smoothing the design pattern in the circuit design layout to be registered; wherein Step S 2 further comprises Step Sa 1 : filling the design pattern to obtain the binary image of the circuit design layout, in the binary image of the circuit design layout, a gray value of the design pattern is 1, and a gray value outside the design pattern is 0.

4. The method according to claim 1 , wherein Step S 2 comprises: Step Sb 1 : extracting a contour of the scanning pattern in the scanning electron microscope image to be registered; and Step Sb 2 : filling the scanning pattern to obtain the binary image of the scanning electron microscope image, in the binary image of the scanning electron microscope image, a gray value of the scanning pattern is 1, and a gray value outside the scanning pattern is 0.

5. The method according to claim 4 , wherein Step Sb 1 comprises: Step Sb 1 - 1 : obtaining edges of the scanning pattern based on an edge detecting algorithm in image processing; and Step Sb 1 - 2 : obtaining a contour of the scanning pattern; or Step Sb 1 - 1 ′: etching the scanning electron microscope image to be registered; and Step Sb 1 - 2 ′: obtaining a contour of the scanning pattern based on an edge detecting algorithm in imaging processing.

6. The method according to claim 4 , wherein Step Sb 1 comprises: Step Sb 1 - a : presetting gray value threshold; and Step Sb 1 - b : comparing a pixel value of each pixel in the scanning electron microscope image with the gray value threshold to obtain a contour of the scanning pattern.

7. The method according to claim 1 , wherein the binary image of the circuit design layout is Gaussian filtered to obtain a first image, and the binary image of the scanning electron microscope image is Gaussian filtered to obtain a second image; the image template matching method in Step S 4 comprises a normalized correlation coefficient matching method with a calculation formula: [mathematical expression included] T and I are scanning electron microscope image (simplified as T image) and circuit design layout (simplified as I image) respectively, x′ and y′ determine a position of a pixel in the T image, and T (x′, y′) is a gray value of the pixel at (x′, y′) in the T image, A position of each pixel in the I image is expressed as (x+x′, y+y′), and the pixel value is I (x+x′, y+y′).

8. A system for registering a circuit design layout and a scanning electron microscope image, comprising: an input module, configured to input a circuit design layout to be registered and a scanning electron microscope image to be registered; wherein the circuit design layout to be registered comprises at least one design pattern, and the scanning electron microscope image to be registered comprises at least one scanning pattern corresponding to the at least one design pattern; a binary processing module, configured to binarize the circuit design layout to be registered to obtain a binary image of the circuit design layout and binarize the scanning electron microscope image to be registered to obtain a binary of the scanning electron microscope image to be registered, wherein in the binary image of the circuit design layout to be registered, a gray value of the design pattern is 1, and a gray value outside the design pattern is 0; in the binary image of the scanning electron microscope image to be registered, a gray value of the scanning pattern is 1, and a gray value outside the scanning pattern is 0; a Gaussian filtering module, configured to Gaussian filter the binary image of the circuit design layout and the binary image of the scanning electron microscope image to make a gray value to be the largest at central axes of areas where the design pattern and the scanning pattern are located, and a registering module, configured to register the circuit design layout and the scanning electron microscope image according to the central axes by an image template matching method.

9. An electronic device, comprising a storage device and a processor, wherein the storage device is configured to store computer programs, which can be executed to perform the method of claim 1 ; the processor is configured to execute the computer programs to perform the method of claim 1 .

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