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Microstructure and residual stress dependence of molybdenum films on DC magnetron sputtering conditions.

• Authors : Ahmed, Nisar¹ (AUTHOR); S. Khan, Zuhair¹ (AUTHOR) ; Ali, Asghar¹ (AUTHOR)

• Source: Applied Physics A: Materials Science & Processing. Nov2022, Vol. 128 Issue 11, p1-13. 13p. 1 Color Photograph, 3 Charts, 9 Graphs.

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Influence of Annealing Temperature on Some Properties of TiO2/Au Thin Films Prepared by R F and DC Magnetron Sputtering Methods.

• Authors : Sadkhan, Azhar Kadhim¹

• Source: International Journal of Nanoelectronics & Materials. Jan2022, Vol. 15 Issue 1, p61-69. 9p.

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Morphology and Corrosion Behavior Study of Thin TiN Films Deposited at Different Substrates by DC Magnetron Sputtering.

• Authors : Abdallah, B.¹ ; Kakhia, M.¹; Alsadat, W.¹

• Source: Orbital: The Electronic Journal of Chemistry. Jan-Mar2021, Vol. 13 Issue 1, p69-78. 10p.

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Effect of Films Thickness on Structural and Optical Properties of Gold (Au) Thin Films Prepared by DC Magnetron Sputtering.

• Authors : Amer, Moatasim¹ ; Ghazai, Alaa Jabbar¹

Subjects: *DC sputtering; *MAGNETRON sputtering; *THIN films

• Source: Iraqi Journal of Science. 2022, Vol. 63 Issue 4, p1549-1556. 8p.

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ZrN-ZrOxNy vs ZrO2-ZrOxNy coatings deposited via unbalanced DC magnetron sputtering.

• Authors : Cubillos, Gloria I.¹ (AUTHOR) ; Romero, Eduard¹ (AUTHOR); Umaña-Perez, Adriana² (AUTHOR)

• Source: Scientific Reports. 9/23/2021, Vol. 11 Issue 1, p1-19. 19p.

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Effects of Discharge Current and Target Thickness in Dc-Magnetron Sputtering on Grain Size of Copper Deposited Samples.

• Authors : Yahya, Khalid A.¹ ; Rasheed, Ban F.¹

Subjects: *GRAIN size; *MAGNETIC flux density; *COPPER surfaces

• Source: Baghdad Science Journal. 2019, Vol. 16 Issue 1, p84-87. 4p.

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Providing a Specified Level of Electromagnetic Shielding with Nickel Thin Films Formed by DC Magnetron Sputtering

• Authors : Oleg A. Testov; Andrey E. Komlev; Kamil G. Gareev

Subjects: nickel; electromagnetic shielding; metal thin films

• Source: Coatings; Volume 11; Issue 12; Pages: 1455

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EFFECT OF SUBSTRATE TEMPERATURE ON STRUCTURAL PROPERTIES OF NANOSTRUCTURED ZINC OXIDE THIN FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING.

• Authors : Kumar, B.Rajesh¹ ; Rao, T. Subba¹

• Source: Digest Journal of Nanomaterials & Biostructures (DJNB). Jul-Sep2011, Vol. 6 Issue 3, p1281-1287. 7p. 1 Black and White Photograph, 1 Chart, 3 Graphs.

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An XPS and AFM study of Ar+-ion-etched Ni-W alloy surfaces prepared by DC magnetron sputtering.

• Authors : Jasulaitienė, Vitalija; Kondrotas, Rokas; Pakštas, Vidas

• Source: Chemija. 2010, Vol. 21 Issue 2-4, p73-79. 7p. 2 Color Photographs, 3 Charts, 2 Graphs.

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Influence of Deposition Temperature on the Structure and Current-Carrying Friction Performance of Cu Films by DC Magnetron Sputtering Technology.

• Authors : Zhang, Hao; Le, Kai; Wang, Chen

Subjects: COPPER; DC sputtering; MAGNETRON sputtering

• Source: Lubricants (2075-4442); Jan2023, Vol. 11 Issue 1, p8, 19p

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